Elemental distribution in fluorinated amorphous carbon thin films
نویسندگان
چکیده
منابع مشابه
Nitrogen doping of amorphous carbon thin films
Nitrogenated and hydrogenated amorphous carbon (a-C:H:N) films have been deposited by a plasma beam source using a gas mixture of C2H2 , Ar and N2 . The Ar/C2H2 ratio is kept constant at a ratio of 3, with the nitrogen flow allowed to vary. Nonnitrogenated films, with Ar/C2H2 ratios of 3 and 6 were also deposited and analyzed before attempting to identify the modifications to the microstructura...
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ژورنال
عنوان ژورنال: Journal of the American Society for Mass Spectrometry
سال: 2005
ISSN: 1044-0305,1879-1123
DOI: 10.1016/j.jasms.2004.09.022